Point-by-point inscription of 250-nm-period structure in bulk fused silica by tightly-focused femtosecond UV pulses: experiment and numerical modeling


By conducting point-by-point inscription in a continuously moving slab of a pure fused silica at the optimal depth (170 μm depth below the surface), we have fabricated a 250-nm-period nanostructure with 30 nJ, 300 fs, 1 kHz pulses from frequency-tripled Ti:sapphire laser. This is the smallest value for the inscribed period yet reported, and has been achieved with radical improvement in the quality of the inscribed nanostructures in comparison with previous reports. The performed numerical modeling confirms the obtained experimental results.

Publication DOI: https://doi.org/10.2478/s11534-009-0031-y
Divisions: College of Engineering & Physical Sciences > Aston Institute of Photonics Technology (AIPT)
Additional Information: The original publication is available at www.springerlink.com © Versita Warsaw and Springer-Verlag Berlin Heidelberg.
Uncontrolled Keywords: femtosecond UV laser,microfabrication,fused silica,nanostructure,Physics and Astronomy(all)
Publication ISSN: 1644-3608
Last Modified: 02 Jan 2024 18:10
Date Deposited: 13 Sep 2012 07:08
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Related URLs: http://www.scop ... tnerID=8YFLogxK (Scopus URL)
PURE Output Type: Article
Published Date: 2010-04-10
Authors: Nikogosyan, David N.
Dubov, Mykhaylo (ORCID Profile 0000-0002-6764-683X)
Schmitz, Holger
Mezentsev, Vladimir (ORCID Profile 0000-0002-8415-1767)
Bennion, Ian
Bolger, Padraig
Zayats, Anatoly


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