Simpson, Michael (1982). Chemistry of plasmas used in the fabrication of integrated circuits. PHD thesis, Aston University.
| Divisions: | College of Engineering & Physical Sciences > School of Infrastructure and Sustainable Engineering > Chemical Engineering & Applied Chemistry |
|---|---|
| Additional Information: | Department: Chemistry http://ethos.bl.uk Digitised thesis available via EThOS |
| Institution: | Aston University |
| Uncontrolled Keywords: | Chemistry,plasmas,fabrication,integrated circuits |
| Last Modified: | 28 Jun 2024 07:20 |
| Date Deposited: | 13 Jan 2011 11:55 |
| Completed Date: | 1982 |
| Authors: |
Simpson, Michael
|
CORE (COnnecting REpositories)
CORE (COnnecting REpositories)