Nonlinear diffraction in sub-critical femtosecond inscription


Material processing using high-intensity femtosecond (fs) laser pulses is a fast developing technology holding potential for direct writing of multi-dimensional optical structures in transparent media. In this work we re-examine nonlinear diffraction theory in context of fs laser processing of silica in sub-critical (input power less than the critical power of self-focusing) regime. We have applied well known theory, developed by Vlasov, Petrishev and Talanov, that gives analytical description of the evolution of a root-mean-square beam (not necessarily Gaussian) width RRMS(z) in medium with the Kerr nonlinearity.

Additional Information: The European Conference on Lasers and Electro-Optics (CLEO-E), Mu¨nchen (DE), 17 June 2007, Microprocessing (CM2) CLEO/Europe and IQEC 2007 Conference Digest, (Optical Society of America, 2007), paper CM2_2.
Event Title: The European Conference on Lasers and Electro-Optics (CLEO-Europe 2007)
Event Type: Other
Event Location: Munich
Event Dates: 2007-06-17
Uncontrolled Keywords: high-speed optical techniques, laser beams, laser materials processing, optical Kerr effect, Kerr nonlinearity, direct writing, high-intensity femtosecond laser pulses, laser processing, material processing, multidimensional optical structures, nonlinear diffraction theory, root-mean-square beam, sub-critical femtosecond inscription, transparent media
ISBN: 9781424409310
Last Modified: 23 Oct 2019 10:59
Date Deposited: 12 Aug 2010 12:17
Published Date: 2007-06-17
Authors: Turitsyn, Sergei K.
Mezentsev, Vladimir
Dubov, Mykhaylo
Rubenchik, Alexander M.
Fedoruk, Michail P.
Podivilov, Evgeny V.


Item under embargo.

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