Sub-critical regime of femtosecond inscription


We apply well known nonlinear diffraction theory governing focusing of a powerful light beam of arbitrary shape in medium with Kerr nonlinearity to the analysis of femtosecond (fs) laser processing of dielectric in sub-critical (input power less than the critical power of selffocusing) regime. Simple analytical expressions are derived for the input beam power and spatial focusing parameter (numerical aperture) that are required for achieving an inscription threshold. Application of non-Gaussian laser beams for better controlled fs inscription at higher powers is also discussed. © 2007 Optical Society of America.

Additional Information: © 2007 Optical Society of America. This paper was published in Optics Express and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law.
Uncontrolled Keywords: diffraction, laser beams, numerical methods, optical Kerr effect, femtosecond inscription, Gaussian laser beams
Publication ISSN: 1094-4087
Last Modified: 23 Oct 2019 10:59
Date Deposited: 08 Jul 2010 13:21
Published Date: 2007-10
Authors: Turitsyn, Sergei K.
Mezentsev, Vladimir
Dubov, Mykhaylo
Rubenchik, Alexander M.
Fedoruk, Michail P.
Podivilov, Evgeny V.


Item under embargo.

Export / Share Citation


Additional statistics for this record