Liu, X., Thoms, S., Aitchison, J.S., De La Rue, R.M., Williams, John A.R., Everall, Lorna A. and Bennion, Ian (1998). Surface roughness reduction and diffraction efficiency optimisation for e-beam written phase masks. Microelectronic engineering, 41-42 , pp. 199-202.
Abstract
We report the control of surface relief grating parameters and roughness for phase masks produced using e-beam lithography (EBL) and reactive ion etching (RIE). The relationships between processing conditions, grating parameters, surface roughness and the diffraction efficiency of the zeroth and the two first order transmitted beams are discussed.
| Additional Information: | surface relief grating parameters and roughness, e-beam lithography, reactive ion etching, diffraction efficiency of the zeroth |
|---|---|
| Publication ISSN: | 0167-9317 |
| Last Modified: | 17 Oct 2024 11:43 |
| Date Deposited: | 13 Dec 2011 12:15 |
| Published Date: | 1998-03 |
| Authors: |
Liu, X.
Thoms, S. Aitchison, J.S. De La Rue, R.M. Williams, John A.R. Everall, Lorna A. Bennion, Ian |
CORE (COnnecting REpositories)
CORE (COnnecting REpositories)