High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography

Abstract

Abstract Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold. These photoresists showed to be candidates for the fabrication of micro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs.

Publication DOI: https://doi.org/10.1515/nanoph-2021-0263
Divisions: College of Engineering & Physical Sciences > Aston Institute of Photonics Technology (AIPT)
College of Engineering & Physical Sciences
Additional Information: © 2021 Elmina Kabouraki et al., published by De Gruyter. This work is licensed under the Creative Commons Attribution 4.0 International License. Funding: This work has received funding from Laserlab-Europe, the European Union's Horizon 2020 research and innovation program under grant agreement no 871124, and PULSE, the European Union’s Horizon 2020 research and innovation program under grant agreement No 824996.
PURE Output Type: Article
Published Date: 2021-07-23
Published Online Date: 2021-07-23
Accepted Date: 2021-07-07
Authors: Kabouraki, Elmina
Melissinaki, Vasileia
Yadav, Amit
Melninkaitis, Andrius
Tourlouki, Konstantina
Tachtsidis, Theodoros
Kehagias, Nikolaos
Barmparis, Georgios D.
Papazoglou, Dimitris G.
Rafailov, Edik (ORCID Profile 0000-0002-4152-0120)
Farsari, Maria

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