Polymerization-induced self-assembly of block copolymer nanoparticles via RAFT non-aqueous dispersion polymerization


There is considerable current interest in polymerization-induced self-assembly (PISA) via reversible addition–fragmentation chain transfer (RAFT) polymerization as a versatile and efficient route to various types of block copolymer nano-objects. Many successful PISA syntheses have been conducted in water using either RAFT aqueous dispersion polymerization or RAFT aqueous emulsion polymerization. In contrast, this review article is focused on the growing number of RAFT PISA formulations developed for non-aqueous media. A wide range of monomers have been utilized for both the stabilizer and core-forming blocks to produce diblock copolymer nanoparticles in either polar or non-polar media (including supercritical CO2 and ionic liquids) via RAFT dispersion polymerization. Such nanoparticles possess spherical, worm-like or vesicular morphologies, often with controllable size and functionality. Detailed characterization of such sterically stabilized diblock copolymer dispersions provides important insights into the various morphological transformations that can occur both during the PISA synthesis and also on subsequent exposure to a suitable external stimulus (e.g. temperature).

Publication DOI: https://doi.org/10.1016/j.progpolymsci.2015.10.002
Divisions: College of Engineering & Physical Sciences
College of Engineering & Physical Sciences > School of Infrastructure and Sustainable Engineering > Chemical Engineering & Applied Chemistry
Additional Information: © 2015, Elsevier. Licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International http://creativecommons.org/licenses/by-nc-nd/4.0/
Full Text Link: http://gateway. ... 000368751900001
Related URLs: https://www.sci ... 1069?via%3Dihub (Publisher URL)
PURE Output Type: Article
Published Date: 2016-01-01
Accepted Date: 2015-10-12
Authors: Derry, Matthew J. (ORCID Profile 0000-0001-5010-6725)
Fielding, Lee A.
Armes, Steven P.

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