Adaptive modeling of the femtosecond inscription in silica

Abstract

We present an adaptive mesh approach to high performance comprehensive investigation of dynamics of light and plasma pattens during the process of direct laser inscription. The results reveal extreme variations of spatial and temporal scales and tremendous complexity of these patterns which was not feasible to study previously.

Publication DOI: https://doi.org/10.1117/12.647303
Divisions: College of Engineering & Physical Sciences > Aston Institute of Photonics Technology (AIPT)
Additional Information: Copyright 2006 SPIE. One print or electronic copy may be made for personal use only. Systematic reproduction, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.
Uncontrolled Keywords: Adaptive mesh refinement,Femtosecond inscription,Self-focusing,Electrical and Electronic Engineering,Condensed Matter Physics
Publication ISSN: 1996-756X
Last Modified: 08 Jan 2024 09:00
Date Deposited: 21 Feb 2019 16:28
Full Text Link:
Related URLs: http://www.scop ... tnerID=8YFLogxK (Scopus URL)
https://www.spi ... 7303.full?SSO=1 (Publisher URL)
PURE Output Type: Conference article
Published Date: 2006-02-23
Authors: Mezentsev, Vladimir (ORCID Profile 0000-0002-8415-1767)
Petrovic, Jovana
Dreher, Jürgen
Grauer, Rainer

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