Single atom Cu(I) promoted mesoporous titanias for photocatalytic Methyl Orange depollution and H 2 production


Tailoring the physicochemical properties and hence reactivity of semiconductor photocatalysts in a predictable fashion, remains a challenge to their industrial application. Here we demonstrate the striking promotional effect of incorporating single Cu(I) atoms, on aqueous phase photocatalytic dye degradation and H2 production over surfactant-templated mesoporous TiO2. X-ray absorption spectroscopy reveals that ultra-low concentrations of copper (0.02-0.1 wt%) introduced into the mesoporous TiO2 surface create isolated Cu (I) species which suppress charge recombination, and confer a six-fold photocatalytic promotion of Methyl Orange degradation and four-fold enhancement of H2 evolution. The impact of mesopore structure and photophysical properties on photocatalytic activity is also quantified for the first time: calcination increases mesopore size and nanocrystalline order, and induces an anatase to rutile phase transition that is accompanied by a decrease in the optical band gap, increased charge carrier lifetime, and a concomitant significant activity enhancement.

Publication DOI:
Divisions: College of Engineering & Physical Sciences
Additional Information: © 2018, Elsevier. Licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International Funding: EPSRC (EP/K021796/1 and EP/K029525/2)
Uncontrolled Keywords: photocatalysis,titania,mesoporous,copper,XAS
Publication ISSN: 1873-3883
Last Modified: 15 Apr 2024 07:26
Date Deposited: 23 Mar 2018 08:13
Full Text Link: http://linkingh ... 926337318302868
Related URLs: http://linkingh ... 926337318302868 (Publisher URL)
PURE Output Type: Article
Published Date: 2018-09-15
Published Online Date: 2018-03-22
Accepted Date: 2018-03-21
Authors: Trofimovaite, Rima
Parlett, Christopher M.a. (ORCID Profile 0000-0002-3651-7314)
Kumar, Santosh (ORCID Profile 0000-0002-1352-9945)
Frattini, Lucia
Isaacs, Mark A.
Wilson, Karen
Olivi, Luca
Coulson, Ben
Debgupta, Joyashish
Douthwaite, Richard E.
Lee, Adam F.

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