Electroless Nickel Deposition:An Alternative for Graphene Contacting


We report the first investigation into the potential of electroless nickel deposition to form ohmic contacts on single layer graphene. To minimize the contact resistance on graphene, a statistical model was used to improve metal purity, surface roughness, and coverage of the deposited film by controlling the nickel bath parameters (pH and temperature). The metalized graphene layers were patterned using photolithography and contacts deposited at temperatures as low as 60 °C. The contact resistance was 215 ± 23 ω over a contact area of 200 μm × 200 μm, which improved upon rapid annealing to 107 ± 9 ω. This method shows promise toward low-cost and large-scale graphene integration into functional devices such as flexible sensors and printed electronics.

Publication DOI: https://doi.org/10.1021/acsami.6b08290
Divisions: College of Health & Life Sciences
Additional Information: This is an open access article published under a Creative Commons Attribution (CC-BY) License, which permits unrestricted use, distribution and reproduction in any medium, provided the author and source are cited.
Uncontrolled Keywords: contact resistance,contacting graphene,electroless nickel,interface characterization,transmission line method,Materials Science(all)
Publication ISSN: 1944-8252
Full Text Link:
Related URLs: http://www.scop ... tnerID=8YFLogxK (Scopus URL)
PURE Output Type: Article
Published Date: 2016-10-21
Accepted Date: 2016-10-20
Authors: Popescu, Sinziana M. (ORCID Profile 0000-0002-5441-1492)
Barlow, Anders J.
Ramadan, Sami
Ganti, Srinivas
Ghosh, Biswajit
Hedley, John



Version: Published Version

License: Creative Commons Attribution

| Preview

Export / Share Citation


Additional statistics for this record