Thermal re-emission model


Starting from a continuum description, we study the nonequilibrium roughening of a thermal re-emission model for etching in one and two spatial dimensions. Using standard analytical techniques, we map our problem to a generalized version of an earlier nonlocal KPZ (Kardar-Parisi-Zhang) model. In 2 + 1 dimensions, the values of the roughness and the dynamic exponents calculated from our theory go like α ≈ z ≈ 1 and in 1 + 1 dimensions, the exponents resemble the KPZ values for low vapor pressure, supporting experimental results. Interestingly, Galilean invariance is maintained throughout.

Publication DOI:
Divisions: College of Engineering & Physical Sciences > Systems analytics research institute (SARI)
Additional Information: ©2002 American Physical Society
Uncontrolled Keywords: analytic method,article,mathematical analysis,molecular dynamics,molecular physics,nonbiological model,theory,vapor pressure
Publication ISSN: 1550-235X
Last Modified: 18 Jan 2024 08:06
Date Deposited: 17 Dec 2014 11:40
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Related URLs: http://www.scop ... 8ad4fc7fecaafc7 (Scopus URL)
http://journals ... sRevB.65.041405 (Publisher URL)
PURE Output Type: Article
Published Date: 2002-01-04
Authors: Chattopadhyay, Amit K. (ORCID Profile 0000-0001-5499-6008)



Version: Published Version

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