Photosensitivity mechanism of undoped poly(methyl methacrylate) under UV radiation at 325 nm and its spatial resolution limit


In this Letter, we provide evidence suggesting that the main photosensitive mechanism of an undoped poly(methyl methacrylate)-based microstructured optical fiber under UV radiation at 325 nm is a competitive process of both photodegradation and polymerization. We found experimentally that increasing strain during photo-inscription leads to an increased photosensitivity, which is evidence of photodegradation. Likewise, refractive index change in the fiber was measured to be positive, which provides evidence for further polymerization of the material. Finally, we relate the data obtained to the spatial recording resolution of the samples. © 2014 Optical Society of America.

Publication DOI:
Divisions: College of Engineering & Physical Sciences > Aston Institute of Photonics Technology (AIPT)
Uncontrolled Keywords: gratings,fiber optics,fiber Bragg gratings,microstructured fibers,photonic crystal fibers,photonic crystals,photosensitivity,Atomic and Molecular Physics, and Optics
Publication ISSN: 1539-4794
Last Modified: 29 Apr 2024 07:10
Date Deposited: 26 Jun 2014 11:19
Full Text Link: http://ol.osa.o ... I=ol-39-12-3421
Related URLs: http://www.scop ... tnerID=8YFLogxK (Scopus URL)
PURE Output Type: Article
Published Date: 2014-06-15
Published Online Date: 2014-06-04
Authors: Sáez Rodríguez, D.
Nielsen, K.
Bang, O.
Webb, D.J. (ORCID Profile 0000-0002-5495-1296)



Version: Published Version

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