Mask-less lithography for fabrication of optical waveguides


A flexible method for fabricating shallow optical waveguides by using femtosecond laser writing of patterns on a metal coated glass substrate followed by ion-exchange is described. This overcomes the drawbacks of low index contrast and high induced stress in waveguides directly written using low-repetition rate ultrafast laser systems. When compared to conventional lithography, the technique is simpler and has advantages in terms of flexibility in the types of structures which can be fabricated.

Additional Information: M. Dubov ; S. R. Natarajan ; J. A. R. Williams and I. Bennion "Mask-less lithography for fabrication of optical waveguides", Proc. SPIE 6881, Commercial and Biomedical Applications of Ultrafast Lasers VIII, 688110 (February 15, 2008); doi:10.1117/12.762594. Copyright 2008 Society of Photo-Optical Instrumentation Engineers. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.
Event Title: Commercial and Biomedical Applications of Ultrafast Lasers VIII
Event Type: Other
Event Location: San Jose, CA
Event Dates: 2008-01-20 - 2008-01-23
Uncontrolled Keywords: glass, ion exchange, lithography, substrates, ultrashort pulses, femtosecond lithography, mask-less, planar lightwave circuit, Electrical and Electronic Engineering, Condensed Matter Physics
ISBN: 978-0-8194-7056-0
Last Modified: 23 Oct 2019 12:31
Date Deposited: 13 Dec 2012 10:00
Published Date: 2008-02-15
Authors: Dubov, Mykhaylo
Natarajan, S.R.
Williams, John A.R.
Bennion, Ian


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