Adaptive modeling of the femtosecond inscription in silica

Abstract

We present an adaptive mesh approach to high performance comprehensive investigation of dynamics of light and plasma pattens during the process of direct laser inscription. The results reveal extreme variations of spatial and temporal scales and tremendous complexity of these patterns which was not feasible to study previously.

Publication DOI: https://doi.org/10.1117/12.647303
Divisions: Engineering & Applied Sciences > Electrical, Electronic & Power Engineering
Engineering & Applied Sciences > Aston Institute of Photonics Technology
Additional Information: Copyright 2006 SPIE. One print or electronic copy may be made for personal use only. Systematic reproduction, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.
Uncontrolled Keywords: Adaptive mesh refinement,Femtosecond inscription,Self-focusing,Electrical and Electronic Engineering,Condensed Matter Physics
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Related URLs: http://www.scop ... tnerID=8YFLogxK (Scopus URL)
https://www.spi ... 7303.full?SSO=1 (Publisher URL)
PURE Output Type: Conference article
Published Date: 2006-02-23
Authors: Mezentsev, Vladimir ( 0000-0002-8415-1767)
Petrovic, Jovana
Dreher, Jürgen
Grauer, Rainer

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