Impedance analysis of Al2O3/H-terminated diamond metal-oxide-semiconductor structures

Liao, Meiyong, Liu, Jiangwei, Sang, Liwen, Coathup, David, Li, Jiangling, Imura, Masataka, Koide, Yasuo and Ye, Haitao (2015). Impedance analysis of Al2O3/H-terminated diamond metal-oxide-semiconductor structures. Applied Physics Letters, 106 (8),

Abstract

Impedance spectroscopy (IS) analysis is carried out to investigate the electrical properties of the metal-oxide-semiconductor (MOS) structure fabricated on hydrogen-terminated single crystal diamond. The low-temperature atomic layer deposition Al2O3 is employed as the insulator in the MOS structure. By numerically analysing the impedance of the MOS structure at various biases, the equivalent circuit of the diamond MOS structure is derived, which is composed of two parallel capacitive and resistance pairs, in series connection with both resistance and inductance. The two capacitive components are resulted from the insulator, the hydrogenated-diamond surface, and their interface. The physical parameters such as the insulator capacitance are obtained, circumventing the series resistance and inductance effect. By comparing the IS and capacitance-voltage measurements, the frequency dispersion of the capacitance-voltage characteristic is discussed.

Publication DOI: https://doi.org/10.1063/1.4913597
Divisions: Engineering & Applied Sciences > Electrical, Electronic & Power Engineering
Additional Information: © 2015 AIP Publishing LLC. Funding: FP7 Marie Curie Action (300193 and 295208); European Commission; EPSRC (EP/K003070/1), Green Network of Excellence (GRENE), Low-Carbon Research Network (LCnet), and Nanotechnology Platform projects sponsored by the Ministry of Education, Culture, Sports, and Technology (MEXT) in Japan.
Uncontrolled Keywords: Physics and Astronomy (miscellaneous)
Full Text Link: http://scitatio ... .1063/1.4913597
Related URLs: http://www.scop ... tnerID=8YFLogxK (Scopus URL)
Published Date: 2015-02-23
Authors: Liao, Meiyong
Liu, Jiangwei
Sang, Liwen
Coathup, David
Li, Jiangling
Imura, Masataka
Koide, Yasuo
Ye, Haitao ( 0000-0002-4005-4922)

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