Photosensitivity mechanism of undoped poly(methyl methacrylate) under UV radiation at 325 nm and its spatial resolution limit

Sáez Rodríguez, D., Nielsen, K., Bang, O. and Webb, D.J. (2014). Photosensitivity mechanism of undoped poly(methyl methacrylate) under UV radiation at 325 nm and its spatial resolution limit. Optics Letters, 39 (12), pp. 3421-3424.

Abstract

In this Letter, we provide evidence suggesting that the main photosensitive mechanism of an undoped poly(methyl methacrylate)-based microstructured optical fiber under UV radiation at 325 nm is a competitive process of both photodegradation and polymerization. We found experimentally that increasing strain during photo-inscription leads to an increased photosensitivity, which is evidence of photodegradation. Likewise, refractive index change in the fiber was measured to be positive, which provides evidence for further polymerization of the material. Finally, we relate the data obtained to the spatial recording resolution of the samples. © 2014 Optical Society of America.

Publication DOI: https://doi.org/10.1364/OL.39.003421
Divisions: Engineering & Applied Sciences > Electrical, electronic & power engineering
Engineering & Applied Sciences > Institute of Photonics
Uncontrolled Keywords: gratings,fiber optics,fiber Bragg gratings,microstructured fibers,photonic crystal fibers,photonic crystals,photosensitivity,Atomic and Molecular Physics, and Optics
Full Text Link: http://ol.osa.o ... I=ol-39-12-3421
Related URLs: http://www.scop ... tnerID=8YFLogxK (Scopus URL)
Published Date: 2014-06-15
Authors: Sáez Rodríguez, D.
Nielsen, K.
Bang, O.
Webb, D.J. ( 0000-0002-5495-1296)

Download

[img]

Version: Published Version


Export / Share Citation


Statistics

Additional statistics for this record