Underetching from simple stochastic etching kinetics

Claussen, Jens Christian and Carstensen, Jürgen (2007). Underetching from simple stochastic etching kinetics. IN: Physics and Control (PHYSCON) 2007. Potsdam: UNSPECIFIED.

Abstract

The morphological richness of electrochemical semiconductor etching is not sufficiently counterparted yet by theoretical modeling. This paper investigates a minimal version of the Current-Burst model with Aging of F\"oll and Carstensen and demonstrates for a restricted geometry that the Aging concept is essential for underetching, or cavity generation. If the influence of Aging is neglected, the dynamics reduces to a Random Etching Model similar to the Random Deposition model. This computer {\sl gedanken experiment} demonstrates that the stochastic dynamics with ageing-dependent kinetic reaction probabilities accounts for the different etching morphologies compared to those obtained in surface roughening and related systems.

Divisions: Engineering & Applied Sciences
Full Text Link: http://arxiv.or ... ond-mat/0410541
http://lib.phys ... id=af76addc8c25
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Published Date: 2007
Authors: Claussen, Jens Christian ( 0000-0002-9870-4924)
Carstensen, Jürgen

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