Surface roughness reduction and diffraction efficiency optimisation for e-beam written phase masks

Liu, X., Thoms, S., Aitchison, J.S., De La Rue, R.M., Williams, John A.R., Everall, Lorna A. and Bennion, Ian (1998). Surface roughness reduction and diffraction efficiency optimisation for e-beam written phase masks. Microelectronic Engineering, 41-42 , pp. 199-202.

Abstract

We report the control of surface relief grating parameters and roughness for phase masks produced using e-beam lithography (EBL) and reactive ion etching (RIE). The relationships between processing conditions, grating parameters, surface roughness and the diffraction efficiency of the zeroth and the two first order transmitted beams are discussed.

Publication DOI: https://doi.org/10.1016/S0167-9317(98)00045-8
Divisions: Engineering & Applied Sciences > Electrical, electronic & power engineering
Additional Information: surface relief grating parameters and roughness, e-beam lithography, reactive ion etching, diffraction efficiency of the zeroth
Published Date: 1998-03
Authors: Liu, X.
Thoms, S.
Aitchison, J.S.
De La Rue, R.M.
Williams, John A.R. ( 0000-0002-9554-6633)
Everall, Lorna A.
Bennion, Ian

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