Chemistry of plasmas used in the fabrication of integrated circuits

Simpson, Michael (1982). Chemistry of plasmas used in the fabrication of integrated circuits. PHD thesis, Aston University.
Divisions: Engineering & Applied Sciences > Chemical engineering & applied chemistry
Additional Information: Department: Chemistry http://ethos.bl.uk Digitised thesis available via EThOS
Institution: Aston University
Uncontrolled Keywords: Chemistry,plasmas,fabrication,integrated circuits
Completed Date: 1982

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